TAIFUN-CLEAN® COMPACT 110 | KIST + ESCHERICH

TCC110
TCC110
TCC110ESD
TCC110ESD
TCC110ESD

Key Facts

Compact cleaning system
for integrating into new and existing plants
Non-contact cleaning with pulsating compressed air
Great cleaning depth
via special compressed air nozzles with beam bundling
For structured components
and complex component geometries

TAIFUN-CLEAN COMPACT® 110 is perfectly adapted to the TAIFUN-CLEAN® rotating nozzle due to its round design. The symmetrical arrangement of the emitter tips creates uniform ion clouds.
- We offer several TAIFUN-CLEAN® COMPACT modules to facilitate the adaptation to complex shaped components
- Contactless cleaning protects the material surface
- Integrated ionisation to neutralise electrostatic surface charges
- Ionisation system contact-voltage proof for users
- Stable pressure-independent rev speed thanks to its patented, integrated control
- Option: Rev speed monitoring
- Additional variants available: CR, ESD

	TCC110	TCC110CR	TCC110ESD
	Standard	Cleanroom optimised	ESD applications
Working width	100 mm	100 mm	100 mm
Working distance (min. – max.)	20 - 50 mm	20 - 50 mm	20 - 50 mm
Rotating nozzle type	TCR-7A-070	TCR-7A-070-VA	TCR-7A-070
Operating air pressure for cleaning system (recommended)	1.5 - 3.5 bar	1.5 - 3.5 bar	1.5 - 3.5 bar
Operating air pressure for cleaning system (min. – max.)	1.0 - 5.0 bar	1.0 - 5.0 bar	1.0 - 5.0 bar
Type compressed air connection for the cleaning system	Ø 10 mm	Ø 10 mm	Ø 10 mm
Type Ionisation	1x SR55-112	1x SR55-112	1× SIP-INT
Ambient temperature (min. – max.)	5 – 50 °C	5 – 50 °C	5 – 50 °C
Weight	1.1 kg	1.1 kg	1.3 kg
Conveying direction (uni-/bi-/multidirectional)	multidirectional	multidirectional	multidirectional

TCC110
TCC110ESD
Nl/min at operating pressure
1.0 bar 2.0 bar 3.5 bar
TCC110 140 220 340
- Datasheet
  - PDF

TechnologyTAIFUN-CLEAN®

TAIFUN-CLEAN® begins where others have reached their limits. Would you like to learn more about the technology behind our product?

Details of our TAIFUN-CLEAN® technology

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